Ion Implantation Technology

ISBN: 9780735403666

出版社: Springer Verlag

出版年: 2006-12

页数: 664

定价: $ 163.85

装帧: HRD

内容简介

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.